ProE-Vap® 10 0 Delivery System

2022-10-21
●The ProE-Vap® 100 delivery system is designed for solid precursors used in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) processes. It provides a stable mass flux for a wide variety of solid materials used for current and future technology nodes. Solid precursors are difficult to deliver consistently into deposition chambers due to their low vapor pressure and limited thermal stability. The ProE-Vap system overcomes these problems and offers a solution that is unmatched in the industry.
●The ProE-Vap delivery system allows for higher transport of solid precursors at lower temperatures more consistently than other vaporizers, thus reducing cost of ownership for ALD and CVD.
●It minimizes chemical concentration drifts, allowing for higher wafer throughput with less tool downtime. The ProE-Vap has demonstrated high reliability and robust performance in high-volume manufacturing environments since 2008. It supports delivery of a variety of inorganic and transition metal precursors required in the fabrication of highly complex microelectronic device fabrication.
●Available in multiple configurations for installation on different OEM tool sets.

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100 Delivery System

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High-κ capacitors ]gate dielectrics ]Metal barriers ]electrodes ]Fluorine-free tungsten ]FFW ]

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Datasheet

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Please see the document for details

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2016/7/8

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