ProE-Vap® 200 Delivery System
●The ProE-Vap delivery system allows for higher transport of solid precursors at lower temperatures more consistently than other vaporizers, thus reducing cost of ownership for ALD and CVD.
●It minimizes chemical concentration drifts, allowing for higher wafer throughput with less tool downtime. The ProE-Vap has demonstrated high reliability and robust performance in high-volume manufacturing environments since 2008. It supports delivery of a variety of inorganic and transition metal precursors required in the fabrication of highly complex microelectronic device fabrication.
●Available in multiple configurations for installation on different OEM tool sets.
●FEATURES & BENEFITS:
■Over seven times higher fill capacity than the ProE-Vap 100
▲Higher flux applications including batch furnaces
▲Less frequent source changes
■Innovative designed ampoule for solid precursor delivery
■Delivers higher mass flux at lower temperature than conventional vaporizers
■Supports pneumatic and manual valve options
■Outstanding overall performance with consistent flux over the vaporizer lifetime
■Proven for multiple solid precursors used in semicon- ductor applications and can be used for other emerging technologies, such as LED
■Enables efficient usage of precursor and minimizes decomposition from overheating
■Compatible with several OEM tools; supports developmental high volume wafer processing
■Reduces cost of ownership
[ Atomic layer deposition ][ Chemical vapor deposition ][ High-κ capacitors and gate dielectrics ][ Metal barriers and electrodes ][ Fluorine-free tungsten (FFW) ] |
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Please see the document for details |
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English Chinese Chinese and English Japanese |
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2017/1/28 |
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228 KB |
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