LIQUOZON® Stream OZONATED WATER DELIVERY SYSTEM
■The new, LIQUOZON Stream series was designed for applications requiring up to 140 lpm flow and ozone concentrations of 115 - 25 ppm such as wet wafer cleaning, contaminant removal, surface conditioning, water mark removal and oxide growth. Several versions are available to suit special requirements, including an integrated booster pump for low pressure UPW supply, media connections from bottom or lower rear side, and more. As a part of the production proven family of LIQUOZON systems, the LIQUOZON Stream series is based on the same highly reliable and production proven ozone generating and contacting technology.
■Ozone is an environmentally friendly alternative to many process chemicals in the semiconductor industry. It has a high redox potential, can be generated at the point-of-use and is easily converted back to oxygen. cost of purchase, storage and disposal of many chemicals can thus be reduced considerably.
●Features & Benefits
■Superior Ozone Output
▲ Greater than 115 ppm dissolved ozone
▲Ozonated water flow up to 140 lpm
▲Ultra clean for semiconductor applications
▲Long ozone lifetime in water
■Reliable System Performance
▲Constant ozone concentration and operating pressure at varying flow rates
▲Overcomes issues arising from poor UPW facility pressure
▲Ensures sufficient pressure for multi chamber single wafer tools
▲ Industry leading ozone technology
▲MTBF > 20,000 hours
■Space Saving Footprint
▲Extreme compact size compared to dissolved ozone production Faster,
■Easier Installation and Operation
▲No analyzer or cabinet drain connection required
▲Simple operation via Touch Screen
▲Allows subfab installation
■Clean, Safe Alternative
▲High redox potential of ozone
▲Can be generated at point-of-use
▲Green chemical which is easily converted back to oxygen
■Low Cost of Ownership
▲ Reduced chemical consumption and disposal costs
▲Low O2, CDA, cooling water and exhaust consumption
▲Supports batch, single or multiple process tools for maximum efficiency
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[ wet wafer processing ][ multi-chamber single wafer tools ][ wet wafer cleaning ][ contaminant removal ][ surface conditioning ][ water mark removal ][ oxide growth ][ semiconductor industry ] |
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