AMDS-1000 Arc Monitoring and Detection System
●All models connect to the DC generator to poll arc events, gather power information, and support 1-4 chambers per tool. MKS’ Process Eye™ Professional Residual Gas Analyzer software handles data acquisition, interpretation, recall and intelligent alarming when used with the AMDS-1000 system. MKS’ TOOLweb® supports full alarm and data reporting to the fab and Fault Detection and Classification (FDC) of micro and hard arcs during PVD processes including but not limited to Al pad PVD, hard mask PVD, and Cu seed/barrier PVD.
●Product Features
■Analog, digital and combined communication protocols
■Ability to detect micro arcs lasting several microseconds and hard arcs over hundred microseconds
■Analyzes arc data and extracts severity and magnitude in real-time
■Monitors or detects arcs in the whole plasma processing including plasma ignition and power transition
■Multiple chamber support
■Works with MKS Process Eye Professional Residual Gas Analyzer software for data acquisition, interpretation, recall, and intelligent alarming
■ Provides automated monitoring of semiconductor tools when combined with TOOLweb RGA software
●Key Benefits
■Improve wafer yield and reduce tool damage through production intervention and root cause analysis by capturing micro and hard arcs in real-time
■Reduce false alarms by validating arc events when using combined analog and digital communication
■User configurable recipe wizard supports customized warnings and alarms
AMDS-1000 、 AMDS-1000D 、 AMDS-1000A 、 AMDS-1000AD 、 TWR-ARC-AXX 、 TWR-ARC-BXX 、 TWR-ARC-CXX 、 TWR-100-20X 、 330100120 、 106132388 、 KT10013G-02 、 100100001 |
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Datasheet |
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Please see the document for details |
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English Chinese Chinese and English Japanese |
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04/20 |
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352 KB |
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