Impact®Point-of-Use Photochemical Filters

PublishTime：2022-06-29

●Representing a lineage of in-fab production expertise and customer collaboration, Impact® point-of-use (POU) photo-chemical filters deliver superior filtration solutions to critical photolithography processes.
●Array of Membrane Technologies Maximizing Retention Performance and Chemical Compatibility
■Impact filters utilize various membrane technologies to maxi-mize retention performance. The asymmetric UPE membrane enables tighter retention performance and lower pressure drop than a standard symmetrical UPE membrane. The Impact Duo technology, which combines sieving and non-sieving function-ality, removes difficult contaminants from specific photochemi-cals more efficiently than a single sieving filter. Utilizing two times the nylon membrane thickness, the nylon design improves gel retention performance at a 10 nm retention rating for market-leading contamination control. Each membrane technology is characterized for optimal performance in the most common photochemicals and blends in use.
●Innovative Design Solutions
■Entegris offers innovative design solutions. Impact filters use our proven Connectology® technology to quickly and securely connect and seal the filter to the Impact manifold or IntelliGen®dispense system.

Brand of Product：	Entegris
Part#：	A2SK20MK1 、 A2SF20MK1 、 A2ST20MK1 、 A2AX20MK1 、 A2AX2LMK1 、 A2AT20MK1 、 A2AZ200K1 、 A2AZ2LMK1 、 A2AV200K1 、 A2AG200K1 、 A2UH200K1 、 A2UA200K1 、 A2BZ200K1 、 A2DT200K1 、 A2DY200K1 、 A2HV200K1 、 A2MX20MK1 、 A2MT20MK1 、 A2NX200K1 、 A2NT200K1 、 A2NZ200K1 、 APAG20001 、 APAG200K1 、 APAT20M01 、 APAT20MK1 、 APAV20001 、 APAV200K1 、 APAX20M01 、 APAX20MK1 、 APAZ20001 、 APAZ200K1 、 APDT20001 、 APDT200K1 、 APDY20001 、 APDY200K1 、 APMX20M01 、 APMX20MK1 、 APNT20001 、 APNT200K1 、 APNX20001 、 APNX200K1 、 APNZ20001 、 APNZ200K1 、 APSF20M01 、 APSF20MK1 、 APSK20M01 、 APSK20MK1 、 APST20M01 、 APST20MK1 、 APUA20001 、 APUA200K1 、 ATFA000K1 、 ATFG00001 、 ATFV00001 、 ATFV000K1 、 ATFZ00001 、 ATFZ000K1 、 ATTX00001 、 ATAG0LKM1 、 ATAA0LKM1 、 AWAV0LK1 、 AWAG0LK1 、 AWAA0LKM1 、 AWAH0LKM1 More Part#
Product Category：	Filters More
Application：	[ POU photoresist ][ Aggressive solvents ][ High viscosity chemicals ][ HV KrF ][ i-line photoresist for 3D NAND ] More
Data Type：	Datasheet More
Safety & Environment Standards：	More
Operating Temperature：	Please see the document for details
Qualification Grade：	More
Qualification Approval：	More
Package：
Language：	English Chinese Chinese and English Japanese
Date of Creation：	2020/12/4
Version Number：
Data Encoding：
Data Size：	628 KB

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