SilicoMax™ COATING
■Entegris uses its innovative, low-temperature Plasma Enhanced Chemical Vapor Deposition (PECVD) process to deposit a family of silicon carbide coatings for several industrial applications. The dense, micro-conformal, high-purity coatings have very low residual stress, making them an ideal coating for semiconductor equipment. The coatings are amorphous and exhibit high electrical resistivity and wear resistance. SilicoMax™ coatings exhibit high reflectance/high emissivity in the extreme ultraviolet, making them suitable for EUV optical components. The coatings can be deposited on a wide variety of substrates.
●Features
■Low residual stress
■Dense and micro-conformal
■High purity ensures contamination-free operation
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Datasheet |
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Please see the document for details |
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English Chinese Chinese and English Japanese |
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2014/6/4 |
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771 KB |
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