SEMOZON® AX8575 Stand-Alone Ozone Delivery System for Advanced Processes
■The SEMOZON AX8575 is a fully integrated, high output ozone gas delivery system specifically designed for use with an increasing number of semiconductor process applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), photoresist strip, wafer cleaning, contaminant removal, and oxide growth. The system can be configured as a multi-channel system delivering ozone for up to 4 channels supporting multiple chambers or multiple tools. The SEMOZON AX8575 has the highest flexibility with an in-rack chiller option for ultra high concentrations. Flow rates of up to 40 slm and concentrations up to 350g/Nm3 can be achieved depending on the configuration of the system.
●Product Features
■Provides concentrations up to 350g/Nm3 at higher flow rates
■Allows for a fast, easy installation and quick start up with minimum connections required
■Modular design allows each channel to be process matched for maximum flexibility
■Closed-loop concentration control provides tighter process control for higher yields
■User friendly controller with touch screen provides easy, central controls for interfacing with the tool, ozone concentration and flow rate monitoring, and safety monitoring
■MKS patented, field-proven ozone generating technology is implemented in this system for proven reliability
●Key Benefits
■Environmentally friendly solution coverts back to benign O2, eliminating the need for hazardous chemical disposal
■Generated at point of use removing the need for storage or transportation
■Increases throughput by reducing oxidation time due to high redux potential
■Supports single or multiple process tools for maximum efficiency and a lower cost of operation
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Stand-Alone Ozone Delivery System 、 fully integrated, high output ozone gas delivery system |
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[ semiconductor process applications ][ Atomic Layer Deposition (ALD) ][ Chemical Vapor Deposition (CVD) ][ Tetraethyl Orthosilicate (TEOS) ][ Ozone CVD (HDSACVD) ][ photoresist strip ][ wafer cleaning ][ contaminant removal ][ oxide growth ] |
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Datasheet |
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Please see the document for details |
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English Chinese Chinese and English Japanese |
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2.4 MB |
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