ST-26S Al compatible post etch/post ash clean

2022-10-21
●ST-26S solution contains a complexing agent which greatly enhances the removal of residual metal oxides and other inorganics formed during aggressive plasma etching and ashing. This unique solution effectively permeates heavily oxidized residues and rapidly dissolves them before they can redeposit back onto the substrate. Formulated with an extremely low operating viscosity and a corrosion reducing component, ST-26S is ideal for use in automated photoresist stripping equipment.
●BENEFITS
■Strips plasma deposited oxides and other inorganic residues
■Strips positive photoresist
■Non-corrosive to metals
■Low toxicity, odor and volatility
■Low operating temperature and extremely low solution viscosity ideal for automated spray processing units

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ST-26S

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2017/11/14

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