Vision 2000-A RGA for ALD and CVD Processes

2022-04-18
■The Vision 2000-A Residual Gas Analyzer (RGA) improves process productivity and product quality by providing real-timetrace level monitoring of various gas species, including precursors, reaction byproducts, and contaminants during ALD and CVD processes. It can monitor the chamber baseline for air leaks and background contamination levels. In-situ monitoring of ALD and CVD processes can help characterize and prevent damage to production equipment and wafer yield loss owing to precursor concentration change, chamber leak or contamination.
■The new Modular UniBloc™ Inlet operates up to 200°C, preventing precursor condensation and inlet blockage, as well as improving inlet lifetime (MTTM). The new inlet design eliminates sampling gas delivery delays with minimum internal volumes and surface areas resulting in fast response to dynamic gas chemistries. A variety of sample transfer tubes can be attached directly to the inlet face further improving both response time and sampling fidelity from the point of interest. Additionally, the new design makes field maintenance of valves and flow elements quick, easy and cost effective. Fast scanning electronics allow a wide dynamic range of each scan to monitor process gases and trace byproducts, supporting the fast monitoring needed for ALD.
■The RGA’s quick, wide dynamic range electronic scanning capabilities, combined with a mechanical design that minimizes internal volume and surface area to improve gas delivery speeds,make the Vision 2000-A the choice for monitoring short ALD pulse cycles.
●Product Features
■Modular UniBloc inlet with all metal seals and field serviceable parts
■Temperature inlet up to 200°C (consult the factory for models up to 300°C)
■Direct coupling for a sample transfer tube
■Process Eye™ Professional software for data acquisition, interpretation, recall, and intelligent alarming
■TOOLweb® RGA software for automated monitoring of semiconductor tools (available option)
●Key Benefits
■High temperature inlet enhances lifetime by preventing precursor condensation and process byproduct buildup
■Fast response modular UniBloc inlet, with rapid scanning electronics, provides quick monitoring of ALD process chemistries
■Double filter option improves contamination resistance and increases high mass transmission of precursor and fragment ions
■Sampling inlet, ion source, mass filter and control of the sampling gas result in long lifetime
■Improved service life and ease of maintenance

MKS Instruments

Vision 2000-A

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Part#

Residual Gas Analyzer (RGA)

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ALD ]CVD processes ]

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Datasheet

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Please see the document for details

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01/22

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