Vision 2000-C™ XD & Vision 2000-E™ XD HIGH SENSITIVITY RGAS FOR MULTI-PRESSURE AND CVD/ALD

PublishTime：2022-04-18

■The Vision 2000-C™ XD and Vision 2000-E™ XD systems allow seamless monitoring of a wide range of semiconductor applications, including the complete ALD, CVD, and Etch processes, from base vacuum to process pressures up to 700 Torr. Both systems incorporate patented V-lens™ technology, taking the proven performance of the Vision 2000-C and Vision 2000-E systems to a new level of sensitivity and reliability, previously unachievable with conventional quadrupole mass spectrometry systems (QMS). The V-lens design provides increased sensitivity and reproducibility for the most challenging applications; such as tracking levels of various gas species during etch processes and the chamber clean, passivation sequences, and deposition steps for various ALD, CVD, and Etch processes. With V-lens technology, process engineers can identify and prevent potentially costly issues faster and easier while maximizing yield.
●Features & Benefits
■V-lens technology provides:
▲Cleaner baseline – lower noise across the mass scale
▲Lower detection limits – increased sensitivity up to 10 times improvement at lower masses (<15ppb)
▲Higher data quality – more reliable distinction between gases and background
■UniBloc™ fast-response inlet valve allows sampling at background and process pressures
■Process Eye™ Professional software for data acquisition, interpretation, recall, and intelligent alarming
■TOOLweb® RGA software for automated control and monitoring of semiconductor tools
■Integration with a wide range of ALD, CVD, and Etch tools
■Remote Vacuum Controller (RVC) forfail-safe vacuum operation
■Application-specific RGA designed for continuous in situ monitoring of ALD, CVD, and etching processes:
▲In situ monitoring during chamber clean, passivation and deposition to detect subtle changes in low concentration species and high mass species decay with respect to time
▲Ideal for qualification of new ALD, CVD, or Etch process tools or process sequences
▲Enables precision end-point characterization and process optimization
▲Provides insight into etch rate variations
▲Decreases time to production and timeto ramp
■Baseline monitoring of ALD, CVD, or Etch chambers for air leaks and background contamination levels
■Vacuum troubleshooting for fast PM recovery

Brand of Product：	MKS Instruments
Part#：	Vision 2000-C XD 、 Vision 2000-E XD More Part#
Product Category：	HIGH SENSITIVITY RGAS More
Application：	[ semiconductor applications ][ ALD ][ CVD ][ Etch processes ] More
Data Type：	Datasheet More
Safety & Environment Standards：	More
Operating Temperature：	Please see the document for details
Qualification Grade：	More
Qualification Approval：	More
Package：
Language：	English Chinese Chinese and English Japanese
Date of Creation：	12/17
Version Number：
Data Encoding：
Data Size：	397 KB

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