Enable Highly-Stable Plasma Operations at High Pressures with the Right RPS Solution

PublishTime：2022-11-01

As plasma-enhanced chemical vapor deposition (PECVD) processes evolve, the need for RPS usage has increased dramatically, enabling a diverse range of processes and chemistries. An RPS application for a chemical vapor deposition (CVD) process may involve operating at high gas pressures up to 100 Torr. Considering that the typical operation range of toroidal sources are less than 10 Torr, the high-pressure operation faces operational challenges around ignition, plasma stability, and species concentration control. To satisfy the need for this advanced, higher pressure process, engineers require a stronger solution – one that better adapts to needed design functions and process capabilities. Advanced Energy (AE) developed the Quanta® RPS to meet these challenges. The Quanta includes a very high frequency (VHF) power, solid-state switching match, and capacitively coupled electrode design to enable process engineers and tool designers to use remote plasma sources for processes at high pressures up to 100 Torr.

Brand of Product：	Advanced Energy
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Product Category：	More
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Data Type：	White Paper More
Safety & Environment Standards：	More
Operating Temperature：	Please see the document for details
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Qualification Approval：	More
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Language：	English Chinese Chinese and English Japanese
Date of Creation：	2019/1/8
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Data Size：	755 KB

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