Power Supplies for Pulsed Plasma Technologies: State-of-the-Art and Outlook

PublishTime：2022-05-26

●The power supply is important in the practice of plasma processing because of the intimate connection between it and the plasma. That the output circuits of even simple dc power supplies could affect the results of plasma deposition has been known and investigated for over 30 years. As a better understanding of the nature of the interaction between the power supply and the plasma developed, the power supply design evolved from a simple powering element to a key element in the system. This resulted ultimately in the development of pulsed plasma systems.
●This paper reviews the development of the plasma power supply and its interaction with the plasma with particular emphasis on pulsed systems for plasma processing. Nonlinear effects and the effect of source impedance on plasma properties are discussed. The current state-of-the-art of pulsed power supplies is presented, including system control issues and a brief discussion of intellectual property status in both the United States and Europe. Indications of the directions of future developments in processing and pulsed power supplies are given, including the effect of availability of semiconducting switching devices for RF power generators as well as for DC and low-frequency AC power supplies.

Brand of Product：	Advanced Energy
Part#：
Product Category：	plasma power supply 、 pulsed power supplies 、 low-frequency AC power supplies 、 DC power supplies More
Application：	[ pulsed power equipment ] More
Data Type：	White Paper More
Safety & Environment Standards：	More
Operating Temperature：	Please see the document for details
Qualification Grade：	More
Qualification Approval：	More
Package：
Language：	English Chinese Chinese and English Japanese
Date of Creation：	7.20
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Data Size：	585 KB

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