Self Contained Plasma Source for Remote and Projected Plasma Generation

PublishTime：2022-11-01

This paper introduces a new remote source technology developed to provide high density plasma generation across a broad range of process conditions. The technology utilizes high efficiency VHF electrostatic coupling to provide versatile and robust remote plasma generation. The concept is scalable and adaptable to most any chemistry used for cleaning, etching and even deposition. The unique design allows for operation in multiple modes, ranging from fully remote plasma generation to a projected plasma mode where the active discharge is cast into the processing zone well downstream of the remote source itself. This paper describes some of the important design elements incorporated into these new source devices along with early results illustrating the range in performance exceeding many capabilities of the alternative technologies.

Brand of Product：	Advanced Energy
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Product Category：	More
Application：	More
Data Type：	White Paper More
Safety & Environment Standards：	More
Operating Temperature：	Please see the document for details
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Language：	English Chinese Chinese and English Japanese
Date of Creation：	2018/12/14
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Data Size：	1003 KB

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