INFINITY PLANETARY ION BEAM ETCH SOLUTION

PublishTime：2025-03-15

The Infinity PSIBE is a flexible and versatile batch system designed for low-to-mid throughput applications in the MEMS, semiconductor, data storage, optics, lenses, pilot production, and foundry support markets. It features a small tool footprint and offers benefits such as low plasma damage etching, etch rate selectivity for multiple materials through reactive ion etch and chemically assisted etch, precise end point control with a SIMS detector, and the ability to accommodate multiple substrate sizes up to 8 inches. The system includes features like bias substrate, reactive ion beam etch, chemically assisted ion beam etch, secondary ion mass spectrometer, three substrate planets, small footprint, automation software, and high system uptime with ease of maintenance.

Brand of Product：	DENTON VACUUM
Part#：	INFINITY PLANETARY ION BEAM ETCH SOLUTION More Part#
Product Category：	Planetary Ion Beam Etch System More
Application：	[ MEMS ][ semiconductor ][ data storage ][ optics ][ lenses ][ pilot production ][ foundry support ] More
Data Type：	Datasheet More
Safety & Environment Standards：	More
Operating Temperature：	Please see the document for details
Qualification Grade：	More
Qualification Approval：	More
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Language：	English Chinese Chinese and English Japanese
Date of Creation：
Version Number：
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Data Size：	607 KB

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