Remote Plasma Source Chamber Anodization:SUPERIOR ANODIC COATINGS IN THE XSTREAM® RPS CHAMBER ENSURE RELIABLE, PARTICULATE-FREE CHAMBER CLEANING

PublishTime：2022-11-01

Most anodized aluminum plasma chambers are subject to aluminum fluoride formation and subsequent particulate generation when exposed to fluorine plasmas. Aluminum fluoride particles form when fluorine reaches the underlying aluminum surface and can be accelerated by the presence of substrate coating imperfections, thermal stress, and ion bombardment. The use of proprietary anodization processes and careful design techniques on Advanced Energy® (AE®)’s field-proven Xstream® Remote Plasma Source (RPS) platform virtually eliminate the formation of aluminum fluoride particles, providing reliable, particle-free, remote CVD chamber cleaning with minimal periodic maintenance requirements. The result is maximum tool uptime and drastically reduced maintenance costs.

Brand of Product：	Advanced Energy
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Product Category：	More
Application：	More
Data Type：	White Paper More
Safety & Environment Standards：	More
Operating Temperature：	Please see the document for details
Qualification Grade：	More
Qualification Approval：	More
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Language：	English Chinese Chinese and English Japanese
Date of Creation：	2018/11/8
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Data Size：	499 KB

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