LITMAS® RPS 1501 AND 3001: INTEGRATED PLASMA SOURCE AND POWER-DELIVERY SYSTEM
●Features
■Delivers reactive gas species to the process chamber
■Provides the highest available plasma power density
■Uses durable SiO2 or Al2O3 chamber materials
■Uses patented LitmasMatch™ solid-state power-delivery topology
■Integrates the power supply, match, and plasma chamber in one package
●Benefits
■Reduces charge damage tofragile device structures, enabling higher yields
■Generates high reactive specie fluxes, delivering higher process rates
■Broadens the range of process chemistries, enabling a wide range of applications
■Provides fast matching, stable power delivery for precise process control
■Comprises one small-footprint package, providing reduced CoO
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[ WAFER PRE-CLEAN ][ PVD pre-clean ][ CVD pre-clean ][ SACVD pre-clean ][ LPCVD pre-clean ][ Epitaxial growth ][ Molecular beam epitaxy Photoresist Strip ][ Photoresist strip (ashing) by reactive, ][ oxygen-bearing gases ][ plasma-enhanced etching ][ THIN-FILM DEPOSITION ][ PEALD ][ PECVD ][ PEPVD ][ PERIE ][ Liner film deposition ][ barrier film deposition ][ Epitaxial deposition ][ Nitridation ][ oxidation ][ deposited films ][ Conductor etch ][ Dielectric etch ] |
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Datasheet |
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Please see the document for details |
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English Chinese Chinese and English Japanese |
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2018/6/26 |
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ENG-LitmasRPS-230-07 |
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1.6 MB |
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