GaN Crystal RF Device Data sheet
■high biding energy
●Dislocations in GaN is benign Lasers stable with 100x more dislocation than other semiconductors
●Intrinsic device reliability has been proven in RF applications
●Learn from experience in RF devices Epi quality for high m& low leakage Passivation guidelines for low trapping Principle of electric field management Basic fabrication process
●Challenges:
High voltage epi/ device designs & process realization
New operation space exceeding traditional package schemes
Stringent qualification requirement
GaN RF Device Reliability
GaN Crystal Structure
Supplier and Product Introduction |
|
|
|
Please see the document for details |
|
|
|
|
|
|
|
English Chinese Chinese and English Japanese |
|
2013/3/19 |
|
|
|
|
|
1.4 MB |
- +1 Like
- Add to Favorites
Recommend
All reproduced articles on this site are for the purpose of conveying more information and clearly indicate the source. If media or individuals who do not want to be reproduced can contact us, which will be deleted.