【PCN】Renesas Change wafer fabrication plant and wafer aperture of photocoupler’s photo detector (GET-11721)
Change Description: Regarding photocoupler’s photo detector, we change wafer fabrication plant and wafer aperture.
(New) Naka plant or Kawashiri plant, 8 inch (Current) Shiga plant, 6 inch
This change will be divided into 4 product groups and PCN will be issued 4 times. This document is PCN of the second group. Regarding the PCN plan for each group, please refer to attachment document 1.
Reason for Change: This is because the silicon line at Shiga plant will terminate.
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