Ultrafast Coherent EUV at 25-50 nm using the KMLabs XUUS4TM with the Coherent Astrella®
■Introduction
●Just as the invention of the laser has revolutionized science and technology in recent decades, the recent development of tabletopscale coherent laser sources at much shorter wavelengths, EUV and soft X-rays, is likely to have a transformative impact on science and technology applications requiring laser-like performance at these short wavelengths. Coherent EUV is generated using the high-order harmonic generation (HHG) process driven by a high peak-power ultrafast laser.[1] Applications of HHG light sources include metrology for EUV lithography, spectroscopy, microscopy,[2] and dynamic studies of molecular, [3] magnetic, [4,5] material, [6] and nano systems. [7,8] Depending on application requirements, HHG source characteristics can be tailored to obtain attosecond time resolution or energy/spectral resolution as high as 30 meV/0.1 nm, [9-11] or to enable coherent imaging with spatial resolution as high as 12 nm.[2]
●In the HHG process, an intense femtosecond laser is focused into a gas medium, with the high harmonics generated in the process of field ionization of the gas.[12] However, optimally implementing an HHG source is not simply a matter of focusing the light into a gas jet or cell: the efficiency of conversion into the EUV depends on multiple parameters, and can vary by orders of magnitude. In early experiments, where the objective was simply to observe the generation of high harmonics, this optimization (phase matching) was not critical. But as these sources are used in more challenging real-world applications, achieving the highest possible flux becomes increasingly critical for success. In the past, scientists often spent 1-3 years simply in implementation of a source. Even then, flux measurements in the EUV are difficult and error-prone enough that the source may be vastly un-optimized and underpowered, thus preventing success in the desired application. A successful implementation of an HHG-based EUV source requires acomprehensive approach that simplifies flux and spectrum measurement and allows for reliable EUV flux specifications.
●KMLabs has developed technology to increase the efficiency of EUV generation through phasematched conversion in hollow waveguides,[13-15] and has further optimized the technique in its commercial XUUS 4 ™ product line.[16] The three key elements of a workhorse HHG “tabletop x-ray laser” system are: (1) a robust high average power, high repetition-rate femtosecond driving laser; (2) an optimally implemented, differentially-pumped gas target geometry for high-harmonic generation; and (3) an EUV delivery system engineered to minimize losses and manage thermal loading. This makes it possible to provide a stable, high-quality output beam for applications. KMLabs has supplied their XUUS4™ system for several years as a fully integrated and specified system with their Dragon™ and Wyvern™ ultrafast laser systems; however, the XUUS4™ and beamline system can be driven by other high-quality ultrafast lasers, such as the Coherent Astrella®, with appropriate pulse duration, beam quality and stability specs.
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Application note & Design Guide |
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Please see the document for details |
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English Chinese Chinese and English Japanese |
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2021/11/1 |
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303-544-9068 |
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633 KB |
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