The semiconductor CVD machine shows the DeviceNet monitor application
The thin film will be grown on the wafer in the CVD chamber by the silicon, silicon dioxide or other metal materials. These materials are not only attached to the wafer, but also are attached to the inner wall of the chamber. For a long time, the inner wall will accumulate a grate amount of particles in the chamber. Those particles would affect the yield of the wafer. Due to the CVD machine operates automatically in a sealed room, the production stability should highly be monitored and controlled. Appling a steady and rapid monitoring system become the future trend.
DeviceNet is a cost effective solution to one kind application of control area network. It reduces the connection wires between devices and provides rapid troubleshooting function. This system utilizes XP-8341 and I-8124W as the controlling center of the remote I/O devices. The I-8124W provides DeviceNet master engine to collect the remote I/O data, including pneumatic valve “MKS 683" and Beckhoff DeviceNet I/O. XP-8341 exists an operating program to control the situation in the chamber. It is important to control the reacting time of the wafer in the chamber which have some kind of gas inside. After tuning timing and pressure parameter, this series equipment has been developed successfully and works in some semiconductor factories.
●System Architecture:
■The I-8124W is DeviceNet master.
■DeviceNet slave #1 : Beckhoff PLC
■DeviceNet slave #2 : CAN-8124
■DeviceNet slave #3 : MKS 683
■Other slaves are sensors and I/O channels.
●Feature:
■DeviceNet is kind of industrial network solution with simplicity and safety.
■Reduce wire connection and the complexity of the network.
■Monitoring the real-time yield rate and production.
■Reduce the time and the cost of monitoring.
■Raising the stability of the system.
■More flexibility of the system.
Application note & Design Guide |
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Please see the document for details |
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English Chinese Chinese and English Japanese |
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2015/1/5 |
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381 KB |
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