Programming and Erasing Flash Memory
Devices Using the Keithley S530 Pulse
Generator Option
Introduction and Background
Normally, in parametric test, the instrument used most is the
Source Measurement Unit (SMU). The SMU allows supplying
a DC voltage or current to the device under test (DUT) and
simultaneously measuring the resultant voltage or current.
However, there are some cases where it’s necessary to apply a
voltage to the device in a time-controlled manner. Often, the
duration of these applied voltages must be on the order of a few
microseconds in order to prevent the DUT from over-heating or
being over-stressed. SMUs are not designed to output voltages
this quickly. Therefore, a different instrument is required: a
pulse generator.
A pulse generator allows outputting a voltage in a time-
controlled, time-accurate manner, including control over the
amount of voltage (pulse height), the duration of the pulse
(pulse width), as well as the voltage ramp rate (rise and fall
time). This type of instrument also provides the ability to control
the number of pulses that are output and even to synchronize
multiple pulses.
The Keithley S530 Parametric Test System offers a pulse
generator option that offers two to six channels of pulse outputs,
each of which is capable of outputting a maximum of ±40 VDC
with pulse durations from 100ns to 1s.
Typical applications for a pulse generator are preventing
device heating, time-controlled device stressing or charging,
generating clock signals, fuse testing, and setting and resetting
memory devices. This note describes how the pulse generator
option of the S530 Parametric Test System can be used to
characterize flash memory cells.
Flash Memory Basics
Flash memory is currently the dominant form of solid-state, non-
volatile memory technology. It is used in a wide range of devices
and applications—everything from the common USB “thumb
drive” to smartphones, MP3 players, and digital cameras.
Flash memory is part of a class of MOS devices that use
floating gates. There are two types of flash cells: NOR and NAND.
In NOR technology, the storage cells can be programmed and
erased individually. Unfortunately, the storage densities for this
type of flash memory are comparatively low. In the second type,
NAND, it’s possible to write to the cells individually, but they
must be erased in blocks. NAND-type memory has a much higher
storage density and is by far the most dominant of the two types,
so this note will focus on NAND flash memory.
In addition to the floating gate, NAND flash memory cells
(
Figure 1
) usually have a control gate, drain, source, and bulk.
The memory cell is set (programmed) and reset (erased) by
applying or removing charge from the floating gate. Charge can
be applied or removed from the floating gate of any type of flash
memory cell via Fowler-Nordheim (FN) current tunneling or via
Hot Carrier Injection (HCI). In a normal CMOS transistor, both
of these mechanisms cause device degradation and are usually to
be avoided, but they are beneficial for flash memory. Moreover,
although FN tunneling and HCI are useful for programming and
erasing flash memory, they are also why flash memory cells have
a limited lifetime.
Sidewall Sidewall
Polysilicon control gate
Polysilicon floating gate
ONO Dielectric
Tunnel oxide
P substrate
N+ Source N+ Drain
Figure 1. NAND flash memory cell cross-section
When charge is applied to or removed from the floating gate,
the threshold voltage (V
T
) of the underlying transistor changes
(
Figure 2
). This threshold voltage change is what allows the flash
memory cell to be used as a memory storage device. Further,
once the charge is injected into or removed from the floating
gate, the floating gate remains in that state even after power is
removed, which means flash memory is non-volatile.
To program or erase a flash memory cell, a set of pulses are
applied. Pulses are used because applying a steady DC voltage
would cause the cell to be over-programmed or over-erased.
Once a cell is placed into one of these states, it cannot be set
to the opposite state, usually because the gate oxide has been
damaged in some way. The stimulus voltage must be applied
in a time-controlled manner, which is why a pulse generator
is required.
Number 3177
Application Note
Se ries