SPECIALTY GASES & ENGINEERED MATERIALS
FEATURES & BENEFITS
Innovative designed ampoule
for solid precursor delivery
Delivers higher mass flux at
lower temperature
Supports pneumatic and
manual valve options
Outstanding overall
performance with consistent
flux over the vaporizer lifetime
Proven for multiple solid
precursors used in semicon-
ductor applications and can
be used for other emerging
technologies, such as LED
Enables ecient usage of
precursor and minimizes
decomposition from
overheating
Compatible with several OEM
tools; supports developmental
high volume wafer processing
Reduces cost of ownership
ProE-Vap
®
100
Delivery System
Effective delivery of solid materials
The ProE-Vap
®
100 delivery system is designed for solid
precursors used in Atomic Layer Deposition (ALD) and Chemical
Vapor Deposition (CVD) processes. It provides a stable mass flux
for a wide variety of solid materials used for current and future
technology nodes. Solid precursors are dicult to deliver
consistently into deposition chambers due to their low vapor
pressure and limited thermal stability. The ProE-Vap system
overcomes these problems and oers a solution that is
unmatched in the industry.
The ProE-Vap delivery system allows for higher transport of solid
precursors at lower temperatures more consistently than other
vaporizers, thus reducing cost of ownership for ALD and CVD.
It minimizes chemical concentration drifts, allowing for higher
wafer throughput with less tool downtime. The ProE-Vap
has demonstrated high reliability and robust performance
in high-volume manufacturing environments since 2008.
It supports delivery of a variety of inorganic and transition metal
precursors required in the fabrication of highly complex
microelectronic device fabrication.
Available in multiple configurations for installation on dierent
OEM tool sets.
APPLICATIONS
Atomic layer deposition
• High-κ capacitors and gate
dielectrics
Metal barriers and electrodes
Fluorine-free tungsten (FFW)
129 Concord Road
Billerica, MA 01821
USA
Tel +1 952 556 4181
Fax +1 952 556 8022
Toll Free 800 394 4083
Corporate Headquarters Customer Service
FOR MORE INFORMATION
Please call your Regional Customer Service Center today to learn what Entegris can do for you.
Visit entegris.com and select the Contact Us link to find the customer service center nearest you.
TERMS AND CONDITIONS OF SALE
All purchases are subject to Entegris’ Terms and Conditions of Sale. To view and print this information,
visit entegris.com and select the Terms and Conditions link in the footer.
www.entegris.com
Entegris
®
, the Entegris Rings Design
®
and ProE-Vap
®
are registered trademarks of Entegris, Inc.
VCR
®
is a registered trademark of Swagelok Company.
©2016 Entegris, Inc. | All rights reserved. | Printed in the USA | 7401-7827ENT-0616
DIMENSIONS
SPECIFICATIONS
38.10 mm
(1.50”)
258.27 mm
(10.17”)
162.05 mm
(6.38”)
Ø 107.95 mm
(4.25”)
257 mm ±1.27 mm
(10.12” ±0.05”)
134.11 mm
(5.28”)
Performance Specifications
Maximum
temperature
200°C – 250°C (392°F – 482°F)
depending on configuration
Maximum
pressure
100 psig at operating temperature
Facilities Specifications for
Camp-003012 Configuration
Overall
dimensions
258.27 mm H × Ø139.7 mm W
(10.17” H × 5.5” W)
Gas inlet:
Location Center axis
Fitting type
1
4” female VCR
®
Height 257 mm (10.12”)
Gas outlet
Location 1.5” o center axis
Fitting type
1
4” male VCR
Height 258.27 mm (10.17”)
Material 316L SS
Surface finish ≤10 Ra
Recommended
carrier gases
UHP He (Helium) UHP Ar (Argon)
UHP N
2
(Nitrogen)
Head Gas 5 psi He
6× higher
material
surface
area for
vaporization
Tray allows for
improved heat
transfer to the
material, resulting
in better thermal
uniformity
Carrier gas flow is directed across
solid surface to increase pick-up
rate of vaporizing material