OxiMax™ COATING
■Entegris uses its innovative, low-temperature Plasma Enhanced Chemical Vapor Deposition (PECVD) process to deposit silicon oxide coatings for various industrial applications, including semi-conductor equipment chamber components. The AR properties of the coating make it suitable for coating IR optics. The OxiMax™ coating has low internal stress and is highly adherent and micro-conformal to the substrate surface. This coating is amorphous, highly dense and can be deposited on a wide variety of substrate materials.
●Features
■Optically transparent
■Excellent breakdown voltage
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Datasheet |
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Please see the document for details |
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English Chinese Chinese and English Japanese |
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2014/5/29 |
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592 KB |
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