OxiMax™ COATING

2022-07-04
●Overview
■Entegris uses its innovative, low-temperature Plasma Enhanced Chemical Vapor Deposition (PECVD) process to deposit silicon oxide coatings for various industrial applications, including semi-conductor equipment chamber components. The AR properties of the coating make it suitable for coating IR optics. The OxiMax™ coating has low internal stress and is highly adherent and micro-conformal to the substrate surface. This coating is amorphous, highly dense and can be deposited on a wide variety of substrate materials.
●Features
■Optically transparent
■Excellent breakdown voltage

Entegris

COATING

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2014/5/29

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